碳化鉭濺射靶76.2MM(3.0IN)DIAX6.35MM(0.250IN)THICK,99.95%(METALSBASIS);碳化鉭濺射靶,50.8MM(2.0IN)DIAX3.18MM(0.125
ditantalum monocarbide;Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basi;Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basi;Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basi;Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis);Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis);Einecs 235-119-9;Tantalum carbide (ta2C)